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Microdeposition of metal and oxide structures using ultrashort laser pulses

Zergioti, I, Mailis, S, Vainos, NA, Papakonstantinou, P, Kalpouzos, C, Grigoropoulos, CP and Fotakis, C (1998) Microdeposition of metal and oxide structures using ultrashort laser pulses. Applied Physics A: Materials Science & Processing, 66 . pp. 579-582. [Journal article]


URL: http://www.springerlink.com/content/pkh6tmf7frd0m6p1/

DOI: 10.1007/s003390050717


Abstract. Microdeposition of chromium metal and indium oxide microstructures via femtosecond KrF excimer laser (248 nm) ablation in a forward-transfer mode has been studied. The short pulse length, the short absorption length, and the consequently limited thermal diffusion, lower the ablation threshold and enable the deposition of high-definition features. Experiments carried out in a low-vacuum(0:1Torr) environment result in highly reproducible, well-adhered structures of submicron size. Microdeposition of Cr and polycrystalline In2O3 on glass and silicon substrates is performed. The superior quality of the results allows the direct, one-step fabrication of binary-amplitude and multilevel optical diffractive structures.

Item Type:Journal article
Faculties and Schools:Faculty of Computing & Engineering
Faculty of Computing & Engineering > School of Engineering
Research Institutes and Groups:Engineering Research Institute
Engineering Research Institute > Nanotechnology & Integrated BioEngineering Centre (NIBEC)
ID Code:16141
Deposited By: Professor Pagona Papakonstantinou
Deposited On:26 Oct 2010 10:08
Last Modified:17 Oct 2017 15:54

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