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High-rate low-temperature growth of vertically aligned carbon nanotubes

Shang, NG, Tan, YY, Stolojan, V, Papakonstantinou, P and Silva, SRP (2010) High-rate low-temperature growth of vertically aligned carbon nanotubes. Nanotechnology, 21 . p. 505604. [Journal article]

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URL: http://iopscience.iop.org/0957-4484/21/50/505604

DOI: 10.1088/0957-4484/21/50/505604


We report the low-temperature growth of vertically aligned carbon nanotubes (CNTs) at high growth rates by a photo-thermal chemical vapour deposition (PTCVD) technique using a Ti/Fe bilayer film as the catalyst. The bulk growth temperature of the substrate is as low as 370 °C and the growth rate is up to 1.3 µm min − 1, at least eight times faster than the values reported by traditional thermal CVD methods. Transmission electron microscopy observations reveal that as-grown CNTs are uniformly made of highly crystalline 5–6 graphene shells with an approximately 10 nm outer diameter and a 5–6 nm inner diameter. The low-temperature rapid growth of CNTs is strongly related to the unique top-down heating mode of PTCVD and the use of a Ti/Fe bimetallic solid solution catalyst. The present study will advance the development of CNTs as interconnects in nanoelectronics, through a CMOS-compatible low-temperature deposition method suitable for back-end-of-line processes.

Item Type:Journal article
Faculties and Schools:Faculty of Computing & Engineering
Faculty of Computing & Engineering > School of Engineering
Research Institutes and Groups:Engineering Research Institute
Engineering Research Institute > Nanotechnology & Integrated BioEngineering Centre (NIBEC)
ID Code:16519
Deposited By: Professor Pagona Papakonstantinou
Deposited On:02 Dec 2010 15:24
Last Modified:17 Oct 2017 15:55

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