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Surface Modification of Silver Thin Films Using Low Power Chlorine Plasmas

Escoffier, C, Maguire, PD, McAdams, ET and McLaughlin, JAD (2001) Surface Modification of Silver Thin Films Using Low Power Chlorine Plasmas. Electrochemical and Solid-State Letters, 4 (12). H31. [Journal article]

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URL: http://dx.doi.org/10.1149/1.1414942

DOI: doi:10.1149/1.1414942


Modification of silver thin films to create Ag/AgCl thin film electrodes, using a plasma process, was investigated and the efficiency of the plasma technique was assessed. X-ray photoelectron spectroscopy measurements revealed the presence of AgCl within the thin film after plasma treatment. The observed binding energy peak shifts corroborated with values found in literature. Auger spectroscopy depth analysis showed that, under low input power conditions, the plasma process is controlled by the chlorine flow and the chamber pressure. The quantity of Cl integrated into the silver matrix increased with increasing chamber pressure. ©2001 The Electrochemical Society. All rights reserved.

Item Type:Journal article
Faculties and Schools:Faculty of Computing & Engineering
Faculty of Computing & Engineering > School of Engineering
Research Institutes and Groups:Engineering Research Institute
Engineering Research Institute > Nanotechnology & Integrated BioEngineering Centre (NIBEC)
ID Code:2104
Deposited By: Mrs Ann Blair
Deposited On:27 Nov 2009 13:46
Last Modified:15 Jun 2011 09:51

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