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Etching and printing of diffractive optical microstructures by a femtosecond excimer laser

Mailis, S, Zergioti, I, Koundourakis, G, Ikiades, A, Patentalaki, A, Papakonstantinou, P, Vainos, NA and Fotakis, C (1999) Etching and printing of diffractive optical microstructures by a femtosecond excimer laser. APPLIED OPTICS, 38 . pp. 2301-2308. [Journal article]

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URL: http://www.opticsinfobase.org/ao/abstract.cfm?uri=ao-38-11-2301

DOI: 10.1364/AO.38.002301

Abstract

Diffractive optics fabrication is performed by two complementary processing methods that rely on the photoablation of materials by ultrashort UV laser pulses. The spatially selective ablation of materials permits the direct microetching of high-quality surface-relief patterns. In addition, the direct, spatially selective transfer of the ablated material onto planar and nonplanar receiving substrates provides a complementary microprinting operation. The radiation from the ultrashort pulsed excimer laser results in superior quality at relatively low-energy density levels, owing to the short absorption length and minimal thermal-diffusion effects. Computer-generated holographic structures are produced by both modes of operation. Submicrometer features, including Bragg-type structures, are microprinted ontoplanar and high-curvature optical-fiber surfaces, demonstrating the unique ability of the schemes for complex microstructure and potentially nanostructure development.

Item Type:Journal article
Faculties and Schools:Faculty of Computing & Engineering
Faculty of Computing & Engineering > School of Engineering
Research Institutes and Groups:Engineering Research Institute
Engineering Research Institute > Nanotechnology & Integrated BioEngineering Centre (NIBEC)
ID Code:26088
Deposited By: Professor Pagona Papakonstantinou
Deposited On:21 May 2013 07:56
Last Modified:17 Oct 2017 16:09

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