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Depth-sensitive analysis of a degraded tin oxide electrode surface in a plasma device application

Lemoine, P, Mariotti, D, Maguire, PD and McLaughlin, JAD (2001) Depth-sensitive analysis of a degraded tin oxide electrode surface in a plasma device application. THIN SOLID FILMS, 401 (1-2). pp. 196-202. [Journal article]

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URL: http://www.sciencedirect.com/science?_ob=ArticleURL&_udi=B6TW0-44KTJSG-10&_user=126978&_coverDate=12%2F17%2F2001&_alid=1008228693&_rdoc=1&_fmt=high&_orig=search&_cdi=5548&_sort=r&_docanchor=&view=c&_ct=1&_acct=C000010438&_version=1&_urlVersion=0&_userid=1

DOI: 10.1016/S0040-6090(01)1606-6


The transparent conductive thin films used as electrodes for plasma device applications can be damaged by the background plasma with a resulting spectral alteration of the optical emission of the device, In this work, we studied the surface damage experienced by a plasma-based artificial nose by a combination of surface sensitive techniques. Atomic force microscopy and glancing incidence low, kV scanning electron microscopy show no change of microstructure. Energy dispersive X-ray analysis over a range of low electron energies reveals that the oxide has been reduced. This is confirmed by depth sensitive nanoindentation measurements, which indicate that the hardness and Young modulus are lower for the damaged surface. (C) 2001 Elsevier Science B.V. All rights reserved.

Item Type:Journal article
Keywords:atomic force microscopy; hardness; scanning electron microscopy; tin oxide
Faculties and Schools:Faculty of Computing & Engineering
Faculty of Computing & Engineering > School of Engineering
Research Institutes and Groups:Engineering Research Institute
Engineering Research Institute > Nanotechnology & Integrated BioEngineering Centre (NIBEC)
ID Code:305
Deposited By: Mrs Ann Blair
Deposited On:14 Sep 2009 10:29
Last Modified:24 Feb 2014 10:08

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