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Silicon-based quantum dots: synthesis, surface and composition tuning with atmospheric pressure plasmas

Askari, Sadegh, Macias-Montero, Manuel, Velusamy, Tamilselvan, Maguire, PD, Svrcek, Vladmir and Mariotti, D (2015) Silicon-based quantum dots: synthesis, surface and composition tuning with atmospheric pressure plasmas. Journal of Physics D: Applied Physics, 48 (31). p. 314002. [Journal article]

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URL: http://stacks.iop.org/0022-3727/48/i=31/a=314002

Abstract

The synthesis of silicon and silicon-based quantum dots (diameter < 5�nm) is discussed. Specifically the synthesis of Si-based quantum dots (QDs) by atmospheric pressure plasmas is reviewed and the most recent developments are also reported. Atmospheric pressure plasmas are then compared with other synthesis methods that include low pressure plasmas, wet chemistry, electrochemical etching and laser-based methods. Finally, progress in the synthesis of alloyed silicon QDs is discussed where the nanoscale Si�Sn and Si�C systems are reported. The report also includes a theoretical analysis that highlights some fundamental differences offered by plasmas at atmospheric pressure and that may provide opportunities for novel materials with advantageous properties.

Item Type:Journal article
Keywords:atmospheric pressure plasmas, quantum dots, silicon
Faculties and Schools:Faculty of Computing & Engineering
Faculty of Computing & Engineering > School of Engineering
Research Institutes and Groups:Engineering Research Institute
Engineering Research Institute > Nanotechnology & Integrated BioEngineering Centre (NIBEC)
ID Code:32137
Deposited By: Professor Davide Mariotti
Deposited On:06 Aug 2015 10:16
Last Modified:17 Oct 2017 16:19

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