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Influence of plasma-generated negative oxygen ion impingement on magnetron sputtered amorphous SiO2 thin films during growth at low temperatures

Macias-Montero, Manuel, Garcia-Garcia, F. J., Álvarez, R., Gil-Rostra, J., González, J. C., Cotrino, J., Gonzalez-Elipe, A. R. and Palmero, A. (2012) Influence of plasma-generated negative oxygen ion impingement on magnetron sputtered amorphous SiO2 thin films during growth at low temperatures. Journal of Applied Physics, 111 (5). 054312. [Journal article]

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URL: http://dx.doi.org/10.1063/1.3691950

DOI: doi:10.1063/1.3691950


Item Type:Journal article
Keywords:Plasma, ion impingement, magnetron sputtering, thin films growth
Faculties and Schools:Faculty of Computing & Engineering
Faculty of Computing & Engineering > School of Engineering
Research Institutes and Groups:Engineering Research Institute
Engineering Research Institute > Nanotechnology & Integrated BioEngineering Centre (NIBEC)
ID Code:33739
Deposited By: Mr Manuel Macias-Montero
Deposited On:24 Mar 2016 14:20
Last Modified:24 Mar 2016 14:20

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