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c-C4F8Plasmas for the Deposition of Fluorinated Carbon Films

Terriza, Antonia, Macias-Montero, Manuel, López-Santos, Maria C., Yubero, Francisco, Cotrino, José and González-Elipe, Agustín R. (2014) c-C4F8Plasmas for the Deposition of Fluorinated Carbon Films. Plasma Processes and Polymers, 11 (3). pp. 289-299. [Journal article]

Full text not available from this repository.

URL: http://dx.doi.org/10.1002/ppap.201300129

DOI: doi:10.1002/ppap.201300129


Item Type:Journal article
Keywords:Plasmas, Fluorinated Carbon Films
Faculties and Schools:Faculty of Computing & Engineering
Faculty of Computing & Engineering > School of Engineering
Research Institutes and Groups:Engineering Research Institute
Engineering Research Institute > Nanotechnology & Integrated BioEngineering Centre (NIBEC)
ID Code:33746
Deposited By: Mr Manuel Macias-Montero
Deposited On:24 Mar 2016 14:21
Last Modified:24 Mar 2016 14:21

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